Ion implantation, ‘doping’ in the chip industry, is a process where silicon wafers are first layered with a substrate then implanted with ions, resulting in extended useful life, lower energy leakage and increased yields. With a market share of 70%, Varian dominates the space and has proven very skillful at both growing the market for implant and working to address new markets like solar wafer efficiency, all while protecting gross margins near the top of the industry. For its next act, Varian has taken the lead in plasma doping, a highly differentiated new technology with applications in multiple new end markets.
John Buckingham, The Prudent Speculator
